Model SALD is a planar Atomic Layer Deposition (ALD) coating system launched by Naxau, supporting only planar substrates, mainly used for precise deposition of oxide films such as perovskite and aluminum oxide.
ALD technology is based on self-limiting surface chemical reactions, growing thin films layer by layer on planar substrate surfaces through alternating pulses of precursors, achieving atomic-level thickness control with excellent uniformity and density.
For applications such as perovskite solar cells, aluminum oxide passivation films, and optical functional films, it provides high-quality oxide film deposition solutions, and is a key system for photovoltaics and optoelectronic functional thin film preparation.
Model SALD is designed specifically for Atomic Layer Deposition on planar substrates, achieving atomic-level precise control of oxide films such as aluminum oxide and perovskite, with uniform film thickness and dense, pinhole-free quality.
Suitable for various planar carriers such as glass, wafers, and thin films, providing a reliable deposition platform for cutting-edge applications such as perovskite solar cells, aluminum oxide passivation films, and optical functional films.
Based on self-limiting surface reactions, achieving nanometer-level precise film thickness and excellent uniformity.
Prepared aluminum oxide, perovskite, and other oxide films are dense, pinhole-free, with excellent performance.
Designed specifically for planar substrates, suitable for glass, wafers, thin films, and various carriers.
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