Introduction
In terms of technology architecture, L1000 innovatively adopts a three-chamber vertical in-line design. The central chamber serves as the core coating zone, with product rack reciprocating chambers on both sides, forming an efficient, closed continuous production loop.
Products use vertical top-loading with bottom-fixed fixtures, effectively avoiding coating chipping and surface dust accumulation. This architecture not only breaks through the technology barriers of traditional PVD sputtering in uniformity and adhesion, but also comprehensively enables high-quality mass production of DPC ceramic substrates with the combined performance of low temperature, high speed, and high ionization rate.
